English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  Bayesian group analysis of plasma-enhanced chemical vapour deposition data

Fischer, R. (2004). Bayesian group analysis of plasma-enhanced chemical vapour deposition data. New Journal of Physics, 6: 25. doi:10.1088/1367-2630/6/1/025.

Item is

Files

show Files
hide Files
:
Fischer.pdf (Any fulltext), 402KB
Name:
Fischer.pdf
Description:
-
OA-Status:
Visibility:
Public
MIME-Type / Checksum:
application/pdf / [MD5]
Technical Metadata:
Copyright Date:
-
Copyright Info:
eDoc_access: PUBLIC
License:
-

Locators

show

Creators

show
hide
 Creators:
Fischer, R.1, 2, Author           
Affiliations:
1Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325              
2Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

Content

show
hide
Free keywords: -
 Abstract: A ubiquitous goal in plasma-enhanced chemical vapour deposition (PECVD) is to describe the correlation between film properties and categorical and quantitative input variables. The correlations within the high-dimensional parameter space are described using a multivariate model. Bayesian group analysis is employed to assess the grouping structures of the set of data vectors. This allows to identify sub-groups or meta-groups of predefined groups of data sets, e.g. with respect to source gases. Outliers can be identified by the necessity to form a separate group. The Bayesian approach consistently allows the handling of missing data. The grouping probabilities were compared with classical approaches such as likelihood ratio tests, the Akaike information criterion and a Bayesian variant called Bayesian information criterion. The method was applied to PECVD data of rare-earth oxide film deposition and hydrocarbon film deposition to study the evidence of grouping structures attributed to categorical quantities such as rare-earth components or source gases and quantitative variates such as bias voltage.

Details

show
hide
Language(s): eng - English
 Dates: 2004
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 112336
DOI: 10.1088/1367-2630/6/1/025
URI: http://www.iop.org/EJ/abstract/1367-2630/6/1/025
Other: CIPS Reprint No. 143
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: New Journal of Physics
  Alternative Title : NJP
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: IoP Publishing Ltd and Deutsche Physikalische Gesellschaft
Pages: - Volume / Issue: 6 Sequence Number: 25 Start / End Page: - Identifier: -