Plasma Processes and Film Deposition Using Tetraethoxysilane

Nöthe, M.; Bolt, H.

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Plasma Processes and Film Deposition Using Tetraethoxysilane

Nöthe, M., & Bolt, H. (2000). Plasma Processes and Film Deposition Using Tetraethoxysilane. Surface and Coatings Technology, 131, 102-108. Retrieved from http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TVV-4281174-S-T&_cdi=5544&_user=100196&_orig=browse&_coverDate=09%2F01%2F2000&_sk=998689998&view=c&wchp=dGLbVzz-zSkWb&md5=15beac3bb6e76afcde9ea4733a3fb333&ie=/sdarticle.pdf.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-5E8A-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-5E8B-5

Genre: Journal Article

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Creators:
Nöthe, M.¹, Author
Bolt, H.², Author

Affiliations:
1Forschungszentrum Jülich, Institute for Materials and Processes in Energy Systems, D-52425 Jülich, Germany, ou_persistent22
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 288991
URI: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TVV-4281174-S-T&_cdi=5544&_user=100196&_orig=browse&_coverDate=09%2F01%2F2000&_sk=998689998&view=c&wchp=dGLbVzz-zSkWb&md5=15beac3bb6e76afcde9ea4733a3fb333&ie=/sdarticle.pdf

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Title: Surface and Coatings Technology

Source Genre: Journal

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Pages: - Volume / Issue: 131 Sequence Number: - Start / End Page: 102 - 108 Identifier: ISSN: 0257-8972