Plasma Processes and Film Deposition Using Tetraethoxysilane

Nöthe, M.; Bolt, H.

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Plasma Processes and Film Deposition Using Tetraethoxysilane

MPS-Authors

/persons/resource/persons108745

Bolt, H.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Nöthe, M., & Bolt, H. (2000). Plasma Processes and Film Deposition Using Tetraethoxysilane. Surface and Coatings Technology, 131, 102-108. Retrieved from http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TVV-4281174-S-T&_cdi=5544&_user=100196&_orig=browse&_coverDate=09%2F01%2F2000&_sk=998689998&view=c&wchp=dGLbVzz-zSkWb&md5=15beac3bb6e76afcde9ea4733a3fb333&ie=/sdarticle.pdf.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-5E8A-7

Abstract

There is no abstract available