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  Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar+ ions and water vapor

Hopf, C., Schlüter, M., & Jacob, W. (2008). Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar+ ions and water vapor. Journal of Physics: Conference Series, 100: 062012 (4pp). Retrieved from http://dx.doi.org./10.1088/1742-6596/100/6/062012.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-FE30-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-FE31-5
Genre: Journal Article

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 Creators:
Hopf, C.1, Author           
Schlüter, M.2, Author           
Jacob, W.3, Author           
Affiliations:
1ITER Technology & Diagnostics (ITED), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856290              
2External Organizations, ou_persistent22              
3Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Free keywords: 17th International Vacuum Congress (IVC-17), 13th International Conference on Surface Science (ICSS-13) and International Conference on Nanoscience and Technology (ICN+T 2007), Stockholm, 2007-07-02 to 2007-07-06
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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 319406
URI: http://dx.doi.org./10.1088/1742-6596/100/6/062012
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Title: Journal of Physics: Conference Series
Source Genre: Journal
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Publ. Info: IoP
Pages: - Volume / Issue: 100 Sequence Number: 062012 (4pp) Start / End Page: - Identifier: -