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  What makes a dangling bond a binding site for thermal CH3 radicals? — A combined molecular dynamics and potential energy analysis study on amorphous hydrocarbon films

Maya, P. N., Toussaint, U. v., & Jacob, W. (2013). What makes a dangling bond a binding site for thermal CH3 radicals? — A combined molecular dynamics and potential energy analysis study on amorphous hydrocarbon films. Diamond and Related Materials, 40, 41-50. doi:10.1016/j.diamond.2013.09.005.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-E1A7-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0026-E1A8-2
Genre: Journal Article

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 Creators:
Maya, P. N.1, 2, Author           
Toussaint, U. von1, Author           
Jacob, W.1, Author           
Affiliations:
1Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856327              
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Language(s): eng - English
 Dates: 2013
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 670335
DOI: 10.1016/j.diamond.2013.09.005
URI: http://dx.doi.org/10.1016/j.diamond.2013.09.005
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Title: Diamond and Related Materials
Source Genre: Journal
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Publ. Info: Elsevier B.V.
Pages: - Volume / Issue: 40 Sequence Number: - Start / End Page: 41 - 50 Identifier: -