Comparison of chemical sputtering yields for different graphites at high ion 
flux densities

Grote, H.; Bohmeyer, W.; Reiner, H.-D.; Fuchs, T.; Kornejew, P.; Steinbrink, J.

doi:10.1016/S0022-3115(96)00690-3

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Comparison of chemical sputtering yields for different graphites at high ion flux densities

Grote, H., Bohmeyer, W., Reiner, H.-D., Fuchs, T., Kornejew, P., & Steinbrink, J. (1997). Comparison of chemical sputtering yields for different graphites at high ion flux densities. Journal of Nuclear Materials, 241-243, 1152-1155. doi:10.1016/S0022-3115(96)00690-3.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8A7E-2 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-F70F-D

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Urheber:
Grote, H.^{1, 2, 3}, Autor
Bohmeyer, W.³, Autor
Reiner, H.-D.³, Autor
Fuchs, T.³, Autor
Kornejew, P.³, Autor
Steinbrink, J.⁴, Autor

Affiliations:
1Experimental Plasma Physics 2 (E2), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856292
2W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856314
3Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856324
4Max Planck Society, ou_persistent13

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Schlagwörter: 12th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 12), St. Raphael (France), 1996-05-20 to 1996-05-24

Zusammenfassung: -