Comparison of chemical sputtering yields for different graphites at high ion 
flux densities

Grote, H.; Bohmeyer, W.; Reiner, H.-D.; Fuchs, T.; Kornejew, P.; Steinbrink, J.

doi:10.1016/S0022-3115(96)00690-3

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Comparison of chemical sputtering yields for different graphites at high ion flux densities

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Grote, H.
Experimental Plasma Physics 2 (E2), Max Planck Institute for Plasma Physics, Max Planck Society;
W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Bohmeyer, W.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110239

Reiner, H.-D.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109126

Fuchs, T.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Kornejew, P.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

Steinbrink, J.
Max Planck Society;

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Citation

Grote, H., Bohmeyer, W., Reiner, H.-D., Fuchs, T., Kornejew, P., & Steinbrink, J. (1997). Comparison of chemical sputtering yields for different graphites at high ion flux densities. Journal of Nuclear Materials, 241-243, 1152-1155. doi:10.1016/S0022-3115(96)00690-3.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-8A7E-2

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