The influence of boron doping on the structure and thermal decomposition of 
ultrathin C/B:H films

Schenk, A.; Winter, B.; Lutterloh, C.; Biener, J.; Schubert, U. A.; Küppers, J.

doi:10.1063/1.359185

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The influence of boron doping on the structure and thermal decomposition of ultrathin C/B:H films

Schenk, A., Winter, B., Lutterloh, C., Biener, J., Schubert, U. A., & Küppers, J. (1995). The influence of boron doping on the structure and thermal decomposition of ultrathin C/B:H films. Journal of Applied Physics, 77(11), 6006-6014. doi:10.1063/1.359185.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8EB1-1 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8EB2-0

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Urheber:
Schenk, A.¹, Autor
Winter, B.², Autor
Lutterloh, C.¹, Autor
Biener, J.¹, Autor
Schubert, U. A.³, Autor
Küppers, J.¹, Autor

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22
3Max Planck Society, ou_persistent13