The influence of boron doping on the structure and thermal decomposition of 
ultrathin C/B:H films

Schenk, A.; Winter, B.; Lutterloh, C.; Biener, J.; Schubert, U. A.; Küppers, J.

doi:10.1063/1.359185

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The influence of boron doping on the structure and thermal decomposition of ultrathin C/B:H films

Schenk, A., Winter, B., Lutterloh, C., Biener, J., Schubert, U. A., & Küppers, J. (1995). The influence of boron doping on the structure and thermal decomposition of ultrathin C/B:H films. Journal of Applied Physics, 77(11), 6006-6014. doi:10.1063/1.359185.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8EB1-1 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8EB2-0

Genre: Journal Article

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Creators:
Schenk, A.¹, Author
Winter, B.², Author
Lutterloh, C.¹, Author
Biener, J.¹, Author
Schubert, U. A.³, Author
Küppers, J.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2External Organizations, ou_persistent22
3Max Planck Society, ou_persistent13

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Language(s): eng - English

Dates: Date issued: 1995

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 627726
DOI: 10.1063/1.359185
URI: http://jap.aip.org/resource/1/japiau/v77/i11/p6006_s1

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 77 (11) Sequence Number: - Start / End Page: 6006 - 6014 Identifier: -