Sputtering of boron‐doped graphite USB15—Investigation of the origin of low 
chemical erosion

Schwörer, R.; Roth, J.

doi:10.1063/1.359560

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Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion

Schwörer, R., & Roth, J. (1995). Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion. Journal of Applied Physics, 77(8), 3812-3817. doi:10.1063/1.359560.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8ED1-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-8ED2-8

Genre: Journal Article

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Creators:
Schwörer, R.¹, Author
Roth, J.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 1995

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 627748
DOI: 10.1063/1.359560
URI: http://jap.aip.org/resource/1/japiau/v77/i8/p3812_s1

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Title: Journal of Applied Physics

Source Genre: Journal

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Pages: - Volume / Issue: 77 (8) Sequence Number: - Start / End Page: 3812 - 3817 Identifier: -