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  Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion

Schwörer, R., & Roth, J. (1995). Sputtering of boron‐doped graphite USB15—Investigation of the origin of low chemical erosion. Journal of Applied Physics, 77(8), 3812-3817. doi:10.1063/1.359560.

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 Creators:
Schwörer, R.1, Author           
Roth, J.1, Author           
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              

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Language(s): eng - English
 Dates: 1995
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Journal of Applied Physics
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 77 (8) Sequence Number: - Start / End Page: 3812 - 3817 Identifier: -