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  Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering

Fukarek, W., & Kersten, H. (1994). Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 12(2), 523-528. doi:10.1116/1.579162.

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 Creators:
Fukarek, W.1, Author
Kersten, H., Author
Affiliations:
1Max Planck Society, ou_persistent13              

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Language(s): eng - English
 Dates: 1994
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
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Title: Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 12 (2) Sequence Number: - Start / End Page: 523 - 528 Identifier: -