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Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering

MPS-Authors

Fukarek,  W.
Max Planck Society;

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Fukarek, W., & Kersten, H. (1994). Application of dynamic in situ ellipsometry to the deposition of tin‐doped indium oxide films by reactive direct‐current magnetron sputtering. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films, 12(2), 523-528. doi:10.1116/1.579162.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-90A9-4
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