Surface Processes which Control the Deposition and Etching in the SiH4H2
/Si(s)-Glow Discharge System

Veprek, S.; Ratz, G.; Meindl, K.; Möller, W.

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Surface Processes which Control the Deposition and Etching in the SiH₄H₂/Si(s)-Glow Discharge System

Veprek, S., Ratz, G., Meindl, K., & Möller, W. (1991). Surface Processes which Control the Deposition and Etching in the SiH₄H₂/Si(s)-Glow Discharge System. In H. A. Atwater, F. A. Houle, & D. H. Lowndes (Eds.), Surface Chemistry and Beam-Solid Interactions, Symposium (pp. 19-24). Pittsburgh, PA: Materials Research Society.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-967A-B Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0027-967B-9

Genre: Conference Paper

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Creators:
Veprek, S., Author
Ratz, G., Author
Meindl, K., Author
Möller, W.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Language(s): eng - English

Dates: Date issued: 1991

Publication Status: Issued

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Rev. Type: Internal

Identifiers: eDoc: 630200

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Title: Surface Chemistry and Beam-Solid Interactions

Place of Event: Boston, MA (US)

Start-/End Date: 1990-11-26 - 1990-11-29

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Title: Surface Chemistry and Beam-Solid Interactions, Symposium

Source Genre: Proceedings

Creator(s):
Atwater, H. A., Editor
Houle, F. A., Editor
Lowndes, D. H., Editor

Affiliations:
-

Publ. Info: Pittsburgh, PA : Materials Research Society

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 19 - 24 Identifier: ISBN: 1-55899-093-3

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Title: Materials Research Society Symposium Proceedings

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Pages: - Volume / Issue: 201 Sequence Number: - Start / End Page: - Identifier: -