Surface Processes which Control the Deposition and Etching in the SiH4H2
/Si(s)-Glow Discharge System

Veprek, S.; Ratz, G.; Meindl, K.; Möller, W.

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Surface Processes which Control the Deposition and Etching in the SiH₄H₂/Si(s)-Glow Discharge System

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Möller, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Veprek, S., Ratz, G., Meindl, K., & Möller, W. (1991). Surface Processes which Control the Deposition and Etching in the SiH₄H₂/Si(s)-Glow Discharge System. In H. A., Atwater, F. A., Houle, & D. H., Lowndes (Eds.), Surface Chemistry and Beam-Solid Interactions, Symposium (pp. 19-24). Pittsburgh, PA: Materials Research Society.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-967A-B

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