Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient 
Effects in the Altered Layer

Baretzky, B.; Kiriakidis, G.; Taglauer, E.

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Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer

Baretzky, B., Kiriakidis, G., & Taglauer, E. (1986). Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer. In Erosion and Growth of Solids Stimulated by Atom and Ion Beams (pp. 146-150). Nijhoff.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BAD5-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-BAD6-8

Genre: Book Chapter

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Creators:
Baretzky, B.¹, Author
Kiriakidis, G.², Author
Taglauer, E.³, Author

Affiliations:
1Max Planck Institute for Plasma Physics, ou_persistent27
2External Organizations, ou_persistent22
3Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1986

Publication Status: Issued

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Title: Erosion and Growth of Solids Stimulated by Atom and Ion Beams

Source Genre: Book

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Publ. Info: Nijhoff

Pages: - Volume / Issue: 112 Sequence Number: - Start / End Page: 146 - 150 Identifier: -