Depth Profiling of D Implanted into Ti at Different Temperatures

Roth, J.; Eckstein, W.; Bohdansky, J.

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Depth Profiling of D Implanted into Ti at Different Temperatures

Roth, J., Eckstein, W., & Bohdansky, J. (1980). Depth Profiling of D Implanted into Ti at Different Temperatures. Ion Beam Modification of Materials, 48, 1679-1695.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C29D-9 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0028-C29E-7

Genre: Conference Paper

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Creators:
Roth, J.¹, Author
Eckstein, W.¹, Author
Bohdansky, J.¹, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288

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Dates: Date issued: 1980

Publication Status: Issued

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Title: Ion Beam Modification of Materials

Place of Event: Budapest(HU)

Start-/End Date: 1978-09-04 - 1978-09-08

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Title: Ion Beam Modification of Materials

Source Genre: Journal

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Pages: - Volume / Issue: 48 Sequence Number: - Start / End Page: 1679 - 1695 Identifier: -