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  Physical Sputtering of Low-Z Materials

Gauthier, E., Eckstein, W., Laszlo, J., & Roth, J. (1990). Physical Sputtering of Low-Z Materials. Journal of Nuclear Materials, 176-177, 438-444. doi:10.1016/0022-3115(90)90086-3.

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http://dx.doi.org/10.1016/0022-3115(90)90086-3 (Publisher version)
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 Creators:
Gauthier, E.1, Author           
Eckstein, W.1, Author           
Laszlo, J.2, Author           
Roth, J.1, Author           
Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288              
2Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856328              

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Free keywords: Konferenzbeitrag
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Language(s): eng - English
 Dates: 1990
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/0022-3115(90)90086-3
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Title: Journal of Nuclear Materials
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier B.V.
Pages: - Volume / Issue: 176-177 Sequence Number: - Start / End Page: 438 - 444 Identifier: ISSN: 0022-3115
CoNE: https://pure.mpg.de/cone/journals/resource/954925416962