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  Ultra-thin silicate films on metals

Shaikhutdinov, S. K., & Freund, H.-J. (2015). Ultra-thin silicate films on metals. Journal of Physics: Condensed Matter, 27(44): 443001. doi:10.1088/0953-8984/27/44/443001.

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Silica review J Cond Matt final.pdf (Any fulltext), 2MB
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Silica review J Cond Matt final.pdf
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2015
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IoPP
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 Creators:
Shaikhutdinov, Shamil K.1, Author           
Freund, Hans-Joachim1, Author           
Affiliations:
1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              

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Free keywords: silica; ultrathin films; surface structures
 Abstract: Silica is one of the key materials in many modern technological applications. 'Surface science' approach for understanding surface chemistry on silica-based materials, on the one hand, and further miniaturization of new generation electronic devices, on the other, all these face the necessity of rational design of the ultrathin silica films on electrically conductive substrates. The review updates recent studies in this field. Despite the structural complexity and diversity of silica, substantial progress has recently been achieved in understanding of the atomic structure of truly 2D silicates.

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Language(s): eng - English
 Dates: 2015-01-082015-09-162015-10-132015-11-11
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1088/0953-8984/27/44/443001
 Degree: -

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Title: Journal of Physics: Condensed Matter
  Abbreviation : J. Phys.: Condens. Matter
Source Genre: Journal
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Publ. Info: Bristol, UK : IOP Publishing
Pages: 15 Volume / Issue: 27 (44) Sequence Number: 443001 Start / End Page: - Identifier: ISSN: 0953-8984
CoNE: https://pure.mpg.de/cone/journals/resource/954928562478