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  On the structural development during ultrathin amorphous Al2O3 film growth on Al(111) and Al(100) surfaces by thermal oxidation

Flötotto, D., Wang, Z., & Mittemeijer, E. J. (2015). On the structural development during ultrathin amorphous Al2O3 film growth on Al(111) and Al(100) surfaces by thermal oxidation. Surface Science, 633, 1-7. doi:10.1016/j.susc.2014.11.008.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002C-AA74-B Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-55B9-D
Genre: Journal Article

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 Creators:
Flötotto, David1, Author           
Wang, Zumin1, Author           
Mittemeijer, Eric Jan1, 2, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany, ou_persistent22              

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Free keywords: Abt. Mittemeijer
 Abstract: -

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Language(s): eng - English
 Dates: 2015-032015
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/j.susc.2014.11.008
 Degree: -

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Title: Surface Science
  Abbreviation : Surf. Sci.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Amsterdam : Elsevier
Pages: - Volume / Issue: 633 Sequence Number: - Start / End Page: 1 - 7 Identifier: Other: 0039-6028
CoNE: https://pure.mpg.de/cone/journals/resource/0039-6028