Characterization of thin film displacements in the electron microscope

Sawada, Hidetaka; Ramlau, Reiner; Allen, Christopher S.; Kirkland, Angus I.

doi:10.1063/1.4999003

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Characterization of thin film displacements in the electron microscope

Sawada, H., Ramlau, R., Allen, C. S., & Kirkland, A. I. (2017). Characterization of thin film displacements in the electron microscope. Applied Physics Letters, 111(20): 203104, pp. 1-5. doi:10.1063/1.4999003.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-55EE-6 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002E-55F1-D

Genre: Journal Article

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Creators:
Sawada, Hidetaka¹, Author
Ramlau, Reiner², Author
Allen, Christopher S.¹, Author
Kirkland, Angus I.¹, Author

Affiliations:
1External Organizations, ou_persistent22
2Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863405

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Language(s): eng - English

Dates: Published Online: 2017-11-17Date issued: 2017-11-17

Publication Status: Issued

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Identifiers: URI: https://doi.org/10.1063/1.4999003
DOI: 10.1063/1.4999003

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Title: Applied Physics Letters

Abbreviation : Appl. Phys. Lett.

Source Genre: Journal

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Publ. Info: Melville, NY : American Institute of Physics

Pages: - Volume / Issue: 111 (20) Sequence Number: 203104 Start / End Page: 1 - 5 Identifier: Other: 0003-6951
CoNE: https://pure.mpg.de/cone/journals/resource/954922836223