Deposition of Hydrogenated Carbon Films from Nitrogen Containing Methane Plasmas

Schwarz-Selinger, T.; Jacob, W.

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Deposition of Hydrogenated Carbon Films from Nitrogen Containing Methane Plasmas

Schwarz-Selinger, T., & Jacob, W. (2003). Deposition of Hydrogenated Carbon Films from Nitrogen Containing Methane Plasmas. Talk presented at ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces. Avila. 2003-07-22 - 2003-07-25.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0000-05E9-4 Version Permalink: https://hdl.handle.net/21.11116/0000-0000-05EA-3

Genre: Talk

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Creators:
Schwarz-Selinger, T.^{1, 2}, Author
Jacob, W.^{1, 2}, Author

Affiliations:
1Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856288
2Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society, ou_2074325

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Language(s): eng - English

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Publication Status: Not specified

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Identifiers: eDoc: 120420

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Title: ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces

Place of Event: Avila

Start-/End Date: 2003-07-22 - 2003-07-25

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