Excimer laser replication of ion-implanted photomasks.

Stangl, B.; Mitterauer, J.; Ruedenauer, F. G.; Marowsky, G.

doi:10.1116/1.583302

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Excimer laser replication of ion-implanted photomasks.

Stangl, B., Mitterauer, J., Ruedenauer, F. G., & Marowsky, G. (1985). Excimer laser replication of ion-implanted photomasks. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 3(2), 477-480. doi:10.1116/1.583302.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0001-6514-7 Version Permalink: https://hdl.handle.net/21.11116/0000-0001-6516-5

Genre: Journal Article

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Creators:
Stangl, B., Author
Mitterauer, J., Author
Ruedenauer, F. G., Author
Marowsky, G.¹, Author

Affiliations:
1Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society, ou_578547

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Language(s): eng - English

Dates: Date issued: 1985

Publication Status: Issued

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Rev. Type: Peer

Identifiers: DOI: 10.1116/1.583302

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Title: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Source Genre: Journal

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Pages: - Volume / Issue: 3 (2) Sequence Number: - Start / End Page: 477 - 480 Identifier: -