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  Tailoring metal film texture by use of high atomic mobility at metalsemiconductor interfaces

Wang, J., Schützendübe, P., Qiu, Y., Wang, J., Huang, Y., Liu, Y., et al. (2019). Tailoring metal film texture by use of high atomic mobility at metalsemiconductor interfaces. Applied Surface Science, 475, 117-123. doi:10.1016/j.apsusc.2018.12.260.

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 Creators:
Wang, Jing1, Author
Schützendübe, Peter2, Author           
Qiu, Yongxing3, Author
Wang, Jiangyong4, Author
Huang, Yuan1, Author
Liu, Yongchang1, Author
Wang, Zumin1, Author
Affiliations:
1School of Materials Science and Engineering, Tianjin University, Tianjin 300350, China, ou_persistent22              
2Central Scientific Facility Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              
3Suzhou Institute of Nano-tech and Nano-bionics (SINANO), Chinese Academy of Science, Suzhou 215123, China, ou_persistent22              
4Department of Physics, Shantou University, Shantou 515063, China, ou_persistent22              

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Free keywords: ZWE Materialien
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Language(s): eng - English
 Dates: 2018-12-282019-05-01
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/j.apsusc.2018.12.260
 Degree: -

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Title: Applied Surface Science
  Abbreviation : Appl. Surf. Sci.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Amsterdam : Elsevier B.V.
Pages: - Volume / Issue: 475 Sequence Number: - Start / End Page: 117 - 123 Identifier: ISSN: 0169-4332
CoNE: https://pure.mpg.de/cone/journals/resource/954928576736