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  High-Pressure Modification of BiI3

Schwarz, U., Wosylus, A., Schmidt, M., Akselrud, L., Ormeci, A., Hanfland, M., et al. (2019). High-Pressure Modification of BiI3. Inorganics, 7: 143, pp. 1-12. doi:10.3390/inorganics7120143.

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Schwarz, Ulrich1, Autor           
Wosylus, Aron2, Autor           
Schmidt, Marcus3, Autor           
Akselrud, Lev2, Autor           
Ormeci, Alim2, Autor           
Hanfland, Michael4, Autor
Hermann, Volker4, Autor
Kuntscher, Christine4, Autor
Affiliations:
1Ulrich Schwarz, Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863423              
2Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863405              
3Marcus Schmidt, Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863415              
4External Organizations, ou_persistent22              

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Schlagwörter: Band gap, Band structure calculation, Bismuth, Chemical bonding, High-pressure, Iodine, Optical absorbance, Phase transition, Semiconductor to metal transition, X-ray powder diffraction
 Zusammenfassung: Structural and optical properties as well as chemical bonding of BiI3 at elevated pressures are investigated by means of refinements of X-ray powder diffraction data, measurements of the optical absorption, and calculations of the band structure involving bonding analysis in real space. The data evidence the onset of a phase transition from trigonal (hR24) BiI3 into PuBr3-type (oS16) BiI3 around 4.6 GPa. This high-pressure modification remains stable up to 40 GPa, the highest pressure of this study. The phase exhibits semiconducting properties with constantly decreasing band gap between 5 and 18 GPa. Above this pressure, the absorbance edge broadens significantly. Extrapolation of the determined band gap values implies a semiconductor to metal transition at approximately 35 GPa. The value is in accordance with subtle structural anomalies and the results of band structure calculations. Topological analysis of the computed electron density and the electron-localizability indicator reveal fingerprints for weak covalent Bi-I contributions in addition to dominating ionic interactions for both modifications. © 2019 by the authors. Licensee MDPI, Basel, Switzerland.

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Sprache(n): eng - English
 Datum: 2019-12-132019-12-13
 Publikationsstatus: Erschienen
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 Ort, Verlag, Ausgabe: -
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 Art der Begutachtung: -
 Identifikatoren: DOI: 10.3390/inorganics7120143
 Art des Abschluß: -

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Titel: Inorganics
Genre der Quelle: Zeitschrift
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Ort, Verlag, Ausgabe: Basel, Switzerland : MDPI
Seiten: - Band / Heft: 7 Artikelnummer: 143 Start- / Endseite: 1 - 12 Identifikator: ISSN: 2304-6740
CoNE: https://pure.mpg.de/cone/journals/resource/2304-6740