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  Nonadiabatic surface reaction: Mechanism of electron emission in the Cs+O2 system

Böttcher, A., Imbeck, R., Morgante, A., & Ertl, G. (1990). Nonadiabatic surface reaction: Mechanism of electron emission in the Cs+O2 system. Physical Review Letters, 65(16), 2035-2037. doi:10.1103/PhysRevLett.65.2035.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0007-5F4E-9 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-5F4F-8
Genre: Journal Article

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PhysRevLett.65.2035.pdf (Publisher version), 160KB
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PhysRevLett.65.2035.pdf
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1990
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APS
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 Creators:
Böttcher, Artur1, Author           
Imbeck, R.1, Author           
Morgante, A.1, Author           
Ertl, Gerhard2, Author           
Affiliations:
1Fritz Haber Institute, Max Planck Society, ou_24021              
2Physical Chemistry, Fritz Haber Institute, Max Planck Society, ou_634546              

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 Abstract: Electron emission during oxidation of thin Cs films is confined to the stage Cs2O2→CsO2 and is caused by Auger deexcitation accompanying the (formal) reaction O2-2(s)+O2→2O-2(s). This nonadiabatic process becomes possible because resonance ionization of the affinity level of the impinging O2 molecule upon crossing the Fermi level EF is efficiently suppressed due to the absence of occupied states near EF at the surface.

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Language(s): eng - English
 Dates: 1990-04-231990-10-15
 Publication Status: Issued
 Pages: 3
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1103/PhysRevLett.65.2035
 Degree: -

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Title: Physical Review Letters
  Abbreviation : Phys. Rev. Lett.
Source Genre: Journal
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Publ. Info: Woodbury, N.Y. : American Physical Society
Pages: 3 Volume / Issue: 65 (16) Sequence Number: - Start / End Page: 2035 - 2037 Identifier: ISSN: 0031-9007
CoNE: https://pure.mpg.de/cone/journals/resource/954925433406_1