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Zusammenfassung:
A quantitative structural analysis of the system Si(111)(√3×√3)R30°−B has been performed using photoelectron diffraction in the scanned energy mode. We confirm that the substitutional S5 adsorption site is occupied and show that the interatomic separations to the three nearest-neighbor Si atoms are 1.98(±0.04)Å, 2.14(±0.13)Å, and 2.21(±0.12)Å. These correspond to the silicon atom immediately below the boron atom, the adatom immediately above, and the three atoms to which it is coordinated symmetrically in the first layer.
