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  CHF3 adsorption and decomposition on clean and oxygen covered Al(111)

Kawada, H., Reiff, S., & Block, J. H. (1996). CHF3 adsorption and decomposition on clean and oxygen covered Al(111). Applied Surface Science, 100-101, 587-591. doi:10.1016/0169-4332(96)00344-3.

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 Creators:
Kawada, Hiroki1, Author           
Reiff, Stefan1, Author           
Block, Jochen H.1, Author           
Affiliations:
1Fritz Haber Institute, Max Planck Society, ou_24021              

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 Abstract: The adsorption and decomposition of trifluoromethane (CHF3) on clean and oxygen dosed Al(111) were examined by means of electron energy loss spectroscopy (EELS), Auger electron spectroscopy (AES) and low energy electron diffraction (LEED). CHF3 adsorbs on the clean surface at 120 K. The coadsorption of CHF3 and chemisorbed oxygen leads to a change in the adsorption state of CHF3 indicated by the appearance of new vibrational modes in the EELS spectrum. The presence of minute amounts of oxidic oxygen that can be distinguished from the chemisorbed species has no detectable effect on the reaction behavior of CHF3. Annealing of the CHF3/oxygen adlayer to temperatures in excess of 150 K gives rise to altered EELS features that can be attributed to a decomposition of CHF3.

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Language(s): eng - English
 Dates: 1995-08-151995-11-171996-07-02
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/0169-4332(96)00344-3
 Degree: -

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Title: Applied Surface Science
  Abbreviation : Appl. Surf. Sci.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Amsterdam : Elsevier B.V.
Pages: 5 Volume / Issue: 100-101 Sequence Number: - Start / End Page: 587 - 591 Identifier: ISSN: 0169-4332
CoNE: https://pure.mpg.de/cone/journals/resource/954928576736