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  Hole-initiated melting process of thin films

Jin, C., & Riegler, H. (2023). Hole-initiated melting process of thin films. The Journal of Chemical Physics, 158(22): 221101. doi:10.1063/5.0151788.

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Jin, Chenyu1, Author           
Riegler, Hans1, Author                 
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1Hans Riegler, Theorie & Bio-Systeme, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863502              

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 Abstract: We perform numerical and experimental studies on the melting process of thin films initiated by a small hole in the continuum regime. The presence of a nontrivial capillary surface, namely the liquid/air interface, leads to a few counterintuitive results: (1) The melting point is elevated if the film surface is partially wettable, even with a small contact angle. (2) For a film that is finite in size, melting may prefer to start from the outer boundary rather than a hole inside. (3) More complex melting scenarios may arise, including morphology transitions and the “de facto” melting point being a range instead of a single value. These are verified by experiments on melting alkane films between silica and air. This work continues a series of investigations on the capillary aspects of melting. Both our model and analysis approach can be easily generalized to other systems.

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Language(s): eng - English
 Dates: 2023-06-122023
 Publication Status: Issued
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Title: The Journal of Chemical Physics
  Abbreviation : J. Chem. Phys.
Source Genre: Journal
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Publ. Info: Woodbury, N.Y. : American Institute of Physics
Pages: - Volume / Issue: 158 (22) Sequence Number: 221101 Start / End Page: - Identifier: ISSN: 0021-9606

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Title: arxiv physics.chem-ph
Source Genre: Journal
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Publ. Info: Ithaca : Cornell University
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: - Identifier: ISSN: 2331-8422