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  Defect-induced gap states in Al2O3 thin films on NiAl(110)

Nilius, N., Kulawik, M., Rust, H.-P., & Freund, H.-J. (2004). Defect-induced gap states in Al2O3 thin films on NiAl(110). Physical Review B, 69, 121401–1-121401–4. doi:10.1103/PhysRevB.69.121401.

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PhysRevB.69.121401.pdf (Publisher version), 545KB
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PhysRevB.69.121401.pdf
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2004
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APS
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 Creators:
Nilius, Niklas1, Author           
Kulawik, Maria1, Author           
Rust, Hans-Peter1, Author           
Freund, Hans-Joachim1, Author           
Affiliations:
1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              

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Free keywords: alumina; scanning tunnelling microscopy; defect states; scanning tunnelling spectroscopy; energy gap; insulating thin films
 Abstract: The electronic properties of one-dimensional defects in ultrathin Al2O3 films have been investigated by low-temperature STM and STS. Whereas line defects between two oxide domains show almost no topographic contrast in low bias images, they appear with a distinct corrugation at higher positive sample bias. Conductance spectroscopy and imaging reveal three unoccupied states at +2.5, +3.0, and +4.5 V localized along the domain boundaries. The defect-induced states are responsible for the observed contrast variation and originate most likely from a nonstoichiometric oxide composition at the interface between two Al2O3 domains.

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Language(s): eng - English
 Dates: 2004-03-08
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 222332
DOI: 10.1103/PhysRevB.69.121401
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Title: Physical Review B
  Other : Phys. Rev. B
Source Genre: Journal
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Publ. Info: Woodbury, NY : American Physical Society
Pages: - Volume / Issue: 69 Sequence Number: - Start / End Page: 121401–1 - 121401–4 Identifier: ISSN: 1098-0121
CoNE: https://pure.mpg.de/cone/journals/resource/954925225008