非表示:
キーワード:
silicon; etching; STM; surface structure; surfactants; electrochemistry; dissolution; in-situ processing
要旨:
The etching of Si in alkaline solution is used to fabricate microstructures. A recent study has described the etching reaction at a molecular level. The present paper studies, with in situ scanning tunneling microscopy, the effect of a surfactant (triton) on Si etching and its consequences regarding the resulting surface topography, which is an important question in the preparation of substrates.
