Dynamic behavior of nanometer-scale amorphous intergranular film in silicon 
nitride by in situ high-resolution transmission electron microscopy

Zhang, Z.; Sigle, W.; Koch, C. T.; Rühle, M.

doi:10.1016/j.jeurceramsoc.2011.03.016

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Dynamic behavior of nanometer-scale amorphous intergranular film in silicon nitride by in situ high-resolution transmission electron microscopy

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Sigle, W.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Koch, C. T.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Rühle, M.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Zhang, Z., Sigle, W., Koch, C. T., & Rühle, M. (2011). Dynamic behavior of nanometer-scale amorphous intergranular film in silicon nitride by in situ high-resolution transmission electron microscopy. Journal of the European Ceramic Society, 31(9), 1835-1840. doi:10.1016/j.jeurceramsoc.2011.03.016.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-4E5A-F

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