Characterization of stationary and pulsed inductively coupled RF discharges for 
plasma sterilization. Invited paper

Gans, T.; Osiac, M.; O'Connell, D.; Kadetov, V. A.; Czarnetzki, U.; Schwarz-Selinger, T.; Halfmann, H.; Awakowicz, P.

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Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization. Invited paper

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Schwarz-Selinger, T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Gans, T., Osiac, M., O'Connell, D., Kadetov, V. A., Czarnetzki, U., Schwarz-Selinger, T., Halfmann, H., & Awakowicz, P. (2005). Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization. Invited paper. Plasma Physics and Controlled Fusion, 47(5A), A353-A360. Retrieved from http://www.iop.org/EJ/abstract/0741-3335/47/5A/026.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-1693-7

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