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Journal Article

Growth precursors for a-C:H film deposition in a pulsed inductively coupled methane plasmas

MPS-Authors
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Bauer,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger,  T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Bauer, M., Schwarz-Selinger, T., Jacob, W., & von Keudell, A. (2005). Growth precursors for a-C:H film deposition in a pulsed inductively coupled methane plasmas. Journal of Applied Physics, 98: 073302.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-16D2-A
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