Combined Magnetron Sputtering and Ion Implantation - a High Energy Ion Assisted 
Deposition Method for Producing Nano-structurated Coatings

Ruset, C.; Grigore, E.; Maier, H.; Neu, R.

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

会議論文

Combined Magnetron Sputtering and Ion Implantation - a High Energy Ion Assisted Deposition Method for Producing Nano-structurated Coatings

MPS-Authors

Maier, H.
Max Planck Society;

/persons/resource/persons110046

Neu, R.
Tokamak Edge and Divertor Physics (E2), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Ruset, C., Grigore, E., Maier, H., & Neu, R. (2007). Combined Magnetron Sputtering and Ion Implantation - a High Energy Ion Assisted Deposition Method for Producing Nano-structurated Coatings. In Processing and Product Manufacturing: Surface Engineering Using Hybrid Plasma Assisted PVD and CVD Technologies, Nanostructured Coatings (pp. 549-561).

引用: https://hdl.handle.net/11858/00-001M-0000-0027-0AE9-A

要旨

要旨はありません