Secondary electron emission coefficient of C:H and Si:C thin films and some 
relations to their morphology and composition

Groudeva-Zotova, S.; Jacob, W.; Keudell, A. von

doi:10.1016/0925-9635(96)00535-3

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

学術論文

Secondary electron emission coefficient of C:H and Si:C thin films and some relations to their morphology and composition

MPS-Authors

/persons/resource/persons109489

Jacob, W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109597

Keudell, A. von
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Groudeva-Zotova, S., Jacob, W., & Keudell, A. v. (1996). Secondary electron emission coefficient of C:H and Si:C thin films and some relations to their morphology and composition. Diamond and Related Materials, 5(10), 1087-1095. doi:10.1016/0925-9635(96)00535-3.

引用: https://hdl.handle.net/11858/00-001M-0000-0027-8D0A-0

要旨

要旨はありません