Robust Two-Dimensional Electronic Properties in Three-Dimensional 
Microstructures of Rotationally Stacked Turbostratic Graphene

Richter, N.; Hernandez, Yenny R.; Schweitzer, S.; Kim, J. S.; Patra, A. K.; Englert, J.; Lieberwirth, Ingo; Liscio, A.; Palermo, V.; Feng, Xinliang; Hirsch, A.; Müllen, K.; Kläui, M.

doi:10.1103/PhysRevApplied.7.024022

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Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene

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Hernandez, Yenny R.
Dept. Müllen: Synthetic Chemistry, MPI for Polymer Research, Max Planck Society;

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Lieberwirth, Ingo
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

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Müllen, K.
Dept. Müllen: Synthetic Chemistry, MPI for Polymer Research, Max Planck Society;

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Richter, N., Hernandez, Y. R., Schweitzer, S., Kim, J. S., Patra, A. K., Englert, J., Lieberwirth, I., Liscio, A., Palermo, V., Feng, X., Hirsch, A., Müllen, K., & Kläui, M. (2017). Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene. Physical Review Applied, 7(2):. doi:10.1103/PhysRevApplied.7.024022.

引用: https://hdl.handle.net/11858/00-001M-0000-002D-0ABC-2

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