English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse
  1. View item / 
  2. Item Summary

Item

ITEM ACTIONSEXPORT
Add to Basket
  Local TagsRelease HistoryDetailsSummary

Released
Journal Article

Dual absorber Fe2O3/WO3 host-guest architectures for improved charge generation and transfer in photoelectrochemical applications

MPS-Authors
/persons/resource/persons78428

Müller,  Alexander
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Department of Chemistry and Center for NanoScience (CeNS), Ludwig-Maximilians- Universität München, Butenandtstr. 5-11, D-81377 Munich, Germany;
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA 94720, United States of America;

/persons/resource/persons136300

Folger,  Alena
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons76047

Scheu,  Christina
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
Supplementary Material (public)
There is no public supplementary material available
Citation

Müller, A., Kondofersky, I., Folger, A., Fattakhova-Rohlfing, D., Bein, T., & Scheu, C. (2017). Dual absorber Fe2O3/WO3 host-guest architectures for improved charge generation and transfer in photoelectrochemical applications. Materials Research Express, 4(1): 016409, pp. 1-9. doi:10.1088/2053-1591/aa570f.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002D-A139-5
Abstract
There is no abstract available