Laser multiphoton ionization spectrum of AlCH3 radicals formed by UV excimer 
laser photolysis of gaseous TMA at 248 nm and 193 nm.

Zhang, Y.; Stuke, M.

doi:10.1143/JJAP.27.L1349

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Laser multiphoton ionization spectrum of AlCH₃ radicals formed by UV excimer laser photolysis of gaseous TMA at 248 nm and 193 nm.

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Zhang, Y.
Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society;

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Stuke, M.
Abteilung Laserphysik, MPI for biophysical chemistry, Max Planck Society;

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Zhang, Y., & Stuke, M. (1988). Laser multiphoton ionization spectrum of AlCH₃ radicals formed by UV excimer laser photolysis of gaseous TMA at 248 nm and 193 nm. Japanese Journal of Applied Physics, 27(2): 7. doi:10.1143/JJAP.27.L1349.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002D-BD27-E

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