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Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process

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Frank,  Anna
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Hieke,  Stefan Werner
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Scheu,  Christina
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Frank, A., Dias, M., Hieke, S. W., Kruth, A., & Scheu, C. (2019). Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process. Talk presented at E-MRS 2019 Spring Meeting. Nice, France. 2019-05-27 - 2019-05-31.


Cite as: http://hdl.handle.net/21.11116/0000-0004-595C-2
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