English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

High-frequency point-contact spectroscopy of TiSi2, TaSi2, and VSi2

MPS-Authors
/persons/resource/persons280090

Jansen,  A. G. M.
High Magnetic Field Laboratory, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280675

Wyder,  P.
High Magnetic Field Laboratory, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Balkashin, O. P., Jansen, A. G. M., Laborde, O., Gottlieb, U., Sukhodub, G. L., Wyder, P., et al. (2002). High-frequency point-contact spectroscopy of TiSi2, TaSi2, and VSi2. Journal of Low Temperature Physics, 129(3-4), 105-116.


Cite as: https://hdl.handle.net/21.11116/0000-000E-ED1B-A
Abstract
High-frequency point-contact spectroscopy as well as
conventional low-frequency PC spectroscopy has been used for
determining the spectral functions of the electron-phonon
interaction (EPI) for three disilicides TiSi2, TaSi2, and VSi2.
The temperature dependences of resistivity have been calculated
from obtained EPI functions. Comparison of calculated
dependences with known experimental data allowed correction of
the electron-phonon interaction constants for the studied
disilicides.