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Physics and applications of Si/SiGe/Si resonant interband tunneling diodes

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Duschl,  R.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Eberl,  K.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Duschl, R., & Eberl, K. (2000). Physics and applications of Si/SiGe/Si resonant interband tunneling diodes. Thin Solid Films, 380, 151-153.


Cite as: https://hdl.handle.net/21.11116/0000-000E-EA71-B
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