Dynamic character of compositional sputter depth profiling by SIMS: A 
comparison of different models for quantitative profile evaluation

Hofmann, Siegfried; Zhong, Feng-Min; Yang, Hao; Wang, Jiang-Yong; Xu, Cong-Kang

doi:10.1116/6.0002233

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Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation

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Hofmann, Siegfried
Department of Physics, Shantou University, 243 Daxue Road, Shantou 515063, Guangdong, China;
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Hofmann, S., Zhong, F.-M., Yang, H., Wang, J.-Y., & Xu, C.-K. (2023). Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation. Journal of Vacuum Science and Technology. A, 41(1): 013408. doi:10.1116/6.0002233.

Cite as: https://hdl.handle.net/21.11116/0000-000C-BD9E-E

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