Hofmann, Siegfried Department of Physics, Shantou University, 243 Daxue Road, Shantou 515063, Guangdong, China; Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;
https://doi.org/10.1116/6.0002233 (Verlagsversion)
Hofmann, S., Zhong, F.-M., Yang, H., Wang, J.-Y., & Xu, C.-K. (2023). Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation. Journal of Vacuum Science and Technology. A, 41(1): 013408. doi:10.1116/6.0002233.
