Refractive index measurements of photoresists for three-dimensional direct 
laser writing

Gissibl, T.; Wagner, S.; Sykora, J.; Schmid, M.; Giessen, H.

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Refractive index measurements of photoresists for three-dimensional direct laser writing

MPS-Authors

Sykora, J.
Max Planck Society;

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Schmid, M.
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

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Giessen, H.
Former Research Groups, Max Planck Institute for Solid State Research, Max Planck Society;

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引用

Gissibl, T., Wagner, S., Sykora, J., Schmid, M., & Giessen, H. (2017). Refractive index measurements of photoresists for three-dimensional direct laser writing. Optical Materials Express, 7(7), 2293-2298.

引用: https://hdl.handle.net/21.11116/0000-000E-D180-4

要旨

Femtosecond 3D printing is an important technology for manufacturing of nano-and microscopic devices and elements. Crucial for the design of such structures is the detailed knowledge of the refractive index in the visible and near-infrared spectral range and its dispersion. Here, we characterize 5 photoresists that are used with femtosecond 3D direct laser writers, namely IP-S, IP-Dip, IP-L, IP-G, and OrmoComp with a modified and automized Pulfrich refractometer setup, utilizing critical angles of total internal reflection. We achieve an accuracy of 5 . 10(-4) and reference our values to a BK-7 glass plate. We also give Abbe numbers and Schott Catalog numbers of the different resists. Their refractive indices are in the 1.49-1.57 range, while their Abbe numbers are in the range between 35 and 51. (C) 2017 Optical Society of America